“氧化镓”参数说明
级别: | 分析纯AR | 用途: | 实验室 |
含量: | 标准品 | 应用: | 科学研究 |
“氧化镓”详细介绍
X-射线衍射分析X-ray Diffraction Conforms to Structure
纯度Purity≥99.99%Based on Trace Metals Impurities
ICP:Confirms Gallium Component Confirmed
Complexometric EDTA(%Ga)≥71.0%
总痕量金属杂质total metallic impurities≤100ppm by ICP Atomic emission
粒度Partical≤80目(98%以上)
纯度Purity≥99.99%Based on Trace Metals Impurities
ICP:Confirms Gallium Component Confirmed
Complexometric EDTA(%Ga)≥71.0%
总痕量金属杂质total metallic impurities≤100ppm by ICP Atomic emission
粒度Partical≤80目(98%以上)